Title:
LIQUID TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/003484
Kind Code:
A1
Abstract:
This liquid treatment device comprises a treatment tank for swirling an introduced liquid to thereby generate a gas phase in the swirling flow of the liquid, and the device treats the liquid by applying a pulse voltage to the generated gas phase and generating plasma, wherein an insulator, which is an insulating space forming member, is disposed on a wall surface at one end of the treatment tank so as not to affect the swirling flow, and a first electrode is disposed facing a space connected via a through hole of the insulator.
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Inventors:
MIYAKE GAKU
YAMADA YOSHIO
MATSUDA GENICHIRO
KITAI TAKAHIRO
YAMADA YOSHIO
MATSUDA GENICHIRO
KITAI TAKAHIRO
Application Number:
PCT/JP2018/003366
Publication Date:
January 03, 2019
Filing Date:
February 01, 2018
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
C02F1/48; B01F3/04; B01F5/00; B01F5/06; H05H1/24
Domestic Patent References:
WO2014185051A1 | 2014-11-20 |
Foreign References:
US8734654B2 | 2014-05-27 | |||
JP2013119043A | 2013-06-17 | |||
JP2006130410A | 2006-05-25 | |||
US6117401A | 2000-09-12 | |||
JP2017225965A | 2017-12-28 | |||
JP2013119043A | 2013-06-17 |
Other References:
See also references of EP 3647276A4
Attorney, Agent or Firm:
KAMATA Kenji et al. (JP)
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