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Patent Searching and Data


Title:
MAGNETRON AND MAGNETRON SPUTTERING DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/109927
Kind Code:
A1
Abstract:
A magnetron (100) and a magnetron sputtering device, comprising an inner magnetic pole (120) and an outer magnetic pole (130) with opposite polarities. Both the inner magnetic pole (120) and the outer magnetic pole (130) comprise multiple spirals (122, 124, 126, 132, 134, 136). The spirals (132, 134, 136) of the outer magnetic pole (130) surround the spirals (122, 124, 126) of the inner magnetic pole (120), and a gap (140) exists therebetween. In addition, the gap (140) has different widths in different locations from a spiral center to an edge. Moreover, both the spirals (132, 134, 136) of the outer magnetic pole (130) and the spirals (122, 124, 126) of the inner magnetic pole (120) follow a polar equation: r=a×θn+b×(cosθ)m+c×(tanθ)k+d, 0≤n≤2, 0≤m≤2, c=0 or k=0. Because the gap (140) between the inner magnetic pole (120) and the outer magnetic pole (130) has the different widths in a spiral discrete direction, width sizes of the gap (140) in the different locations can be changed to control magnetic field strength distribution in a plane, thus adjusting uniformity of a membrane thickness.

Inventors:
YANG YUJIE (CN)
LI QIANG (CN)
QIU GUOQING (CN)
BAI ZHIMIN (CN)
WANG HOUGONG (CN)
DING PEIJUN (CN)
LV FENG (CN)
Application Number:
PCT/CN2014/095758
Publication Date:
July 30, 2015
Filing Date:
December 31, 2014
Export Citation:
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Assignee:
BEIJING NMC CO LTD (CN)
International Classes:
H01J23/087; H01J25/50
Foreign References:
CN102789938A2012-11-21
US20080169186A12008-07-17
US7223322B22007-05-29
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
北京天昊联合知识产权代理有限公司 (CN)
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