Title:
MASK CLEANING APPARATUS AND LASER ANNEALING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2018/139867
Kind Code:
A1
Abstract:
A mask cleaning apparatus is disclosed. The disclosed mask cleaning apparatus comprises: a laser source for generating a laser beam; and a laser emitting unit for emitting a laser beam at an adhesive on a photomask, wherein the laser emitting unit includes: a rotational driving unit for providing a rotational driving force; and a rotating optical system disposed on a moving path of the laser beam, rotated by the rotational driving unit, and moving, by the rotation, the location of the laser beam emitted at the adhesive on the photomask so as to compensate for a spatial energy variation of the laser beam.
Inventors:
HWANG DAE SOON (KR)
Application Number:
PCT/KR2018/001109
Publication Date:
August 02, 2018
Filing Date:
January 25, 2018
Export Citation:
Assignee:
EO TECHNICS CO LTD (KR)
International Classes:
G03F7/20
Foreign References:
| JP2002277914A | 2002-09-25 | |||
| KR101682467B1 | 2016-12-12 | |||
| KR20130113154A | 2013-10-15 | |||
| JPH10335235A | 1998-12-18 | |||
| JP2005101335A | 2005-04-14 |
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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