Title:
MASK-INFORMATION ADJUSTING DEVICE, MASK-DATA ADJUSTING METHOD, AND PROGRAM
Document Type and Number:
WIPO Patent Application WO/2021/205906
Kind Code:
A1
Abstract:
[Problem] With conventional mask-information adjusting devices, there has been a problem in that the data size of mask information with which it is possible to obtain a high-precision exposure pattern is large. [Solution] A mask-information adjusting device (1) is provided with: a target-information acquisition unit (141) that acquires pre-adjustment mask information including a polygonal mask pattern; a processing unit (140) that acquires the degrees of influence concerning the removal of the individual vertices or sides of the mask pattern in association with the vertices or points in relation to an exposure pattern that is generated correspondingly to the mask pattern by using a photomask, and that simplifies the mask pattern by removing the individual vertices or sides in accordance with whether or not a prescribed condition concerning the acquired degrees of influence is satisfied; and an output unit (160) that outputs post-adjustment mask information including the mask pattern that has been simplified by the processing unit (140). The mask-information adjusting device (1) makes it possible to reduce the data size of the mask information, without considerably influencing the exposure pattern.
Inventors:
TSUNODA DAI (JP)
HORIMA YASUAKI (JP)
HORIMA YASUAKI (JP)
Application Number:
PCT/JP2021/012925
Publication Date:
October 14, 2021
Filing Date:
March 26, 2021
Export Citation:
Assignee:
NIPPON CONTROL SYS CORP (JP)
International Classes:
G03F1/20; G03F1/70; G03F7/20; H01L21/027
Foreign References:
| JP2016082150A | 2016-05-16 | |||
| JP2000182921A | 2000-06-30 | |||
| JP2015109099A | 2015-06-11 | |||
| JP2008065246A | 2008-03-21 | |||
| JP2015125162A | 2015-07-06 | |||
| JPH06214376A | 1994-08-05 |
Attorney, Agent or Firm:
TANIGAWA, Hidekazu (JP)
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