Title:
METAL-CONTAINING ONIUM SALT COMPOUND, PHOTODISINTEGRABLE BASE, RESIST COMPOSITION, AND PROCESS FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2018/084050
Kind Code:
A1
Abstract:
Provided are: a metal-containing onium salt compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to ionizing radiation such as extreme ultraviolet (EUV), are excellent in terms of resolution and focal depth in lithography, and can give fine patterns reduced in line width roughness (LWR); and a resist composition containing the metal-containing onium salt compound.
The onium salt compound useful as a photodisintegrable base contains a specific metal.
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Inventors:
NAITO MICHIYA (JP)
HAYAKAWA MASAMICHI (JP)
UTSUMI YOSHIYUKI (JP)
HAYAKAWA MASAMICHI (JP)
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2017/038522
Publication Date:
May 11, 2018
Filing Date:
October 25, 2017
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07F7/22; C07C309/04; C07C309/07; C07C309/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20; C07C381/12
Domestic Patent References:
| WO2011093139A1 | 2011-08-04 |
Foreign References:
| JP2009221454A | 2009-10-01 | |||
| JP2009091351A | 2009-04-30 |
Other References:
KITAMURA, TSUGIO ET AL.: "Reaction of (diacetoxyiodo)bmzene with excess of trifluoromethanesulfonic acid. A convenient route to para-phenylene type hypervalent iodine", TETRAHEDRON, vol. 60, no. 40, 2004, pages 8855 - 8860, XP004565035, DOI: doi:10.1016/j.tet.2004.07.026
BRAVO, F. ET AL.: "Computational Insight into the Reaction Intermediates in the Glycosylation Reaction Assisted by Donor Heteroatoms", JOURNAL OF ORGANIC CHEMISTRY, vol. 68, no. 3, 2003, pages 686 - 691, XP055482178
BRAVO, F. ET AL.: "Computational Insight into the Reaction Intermediates in the Glycosylation Reaction Assisted by Donor Heteroatoms", JOURNAL OF ORGANIC CHEMISTRY, vol. 68, no. 3, 2003, pages 686 - 691, XP055482178
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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