Title:
(METH)ACRYL-BASED BLOCK COPOLYMER AND ACTIVE-ENERGY-RAY CURING COMPOSITION CONTAINING SAID (METH)ACRYL-BASED BLOCK COPOLYMER
Document Type and Number:
WIPO Patent Application WO/2017/110439
Kind Code:
A1
Abstract:
Provided is a (meth)acryl-based block copolymer that is useful in an optical adhesive composition, and with which a cured article that has a superior anti-heat/humidity bleaching properties and that resists bleaching under high-temperature, high-humidity conditions is obtained. The (meth)acryl-based block copolymer contains a methacryl-based polymer block (A) having an active-energy-ray cured group including a partial structure represented by general formula (1) and an acryl-based polymer block (B) that does not have the active-energy-ray cured group, wherein the acryl-based polymer block (B) contains a monomer unit (b1) derived from acrylic acid alkoxyester. (In formula (1), R1 represents a hydrogen atom or a hydrocarbon group having 1-20 carbon atoms.)
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Inventors:
TAKAI JUNYA (JP)
MATSUURA MIKIYA (JP)
SHACHI KENJI (JP)
MATSUURA MIKIYA (JP)
SHACHI KENJI (JP)
Application Number:
PCT/JP2016/086093
Publication Date:
June 29, 2017
Filing Date:
December 05, 2016
Export Citation:
Assignee:
KURARAY CO (JP)
International Classes:
C08F297/02; C08F2/48; C08F299/00
Foreign References:
| JPH11349782A | 1999-12-21 | |||
| JP2012149147A | 2012-08-09 | |||
| JP2008063545A | 2008-03-21 | |||
| JP2007161877A | 2007-06-28 | |||
| US3450681A | 1969-06-17 | |||
| JP2016060797A | 2016-04-25 |
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
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