METHOD FOR DETECTING ETCHING DEFECTS OF ETCHING MACHINE

WIPO Patent Application WO/2022/156204

A1

A method for detecting etching defects of an etching machine, which belongs to the technical field of semiconductor production and fabrication. The method for detecting the etching defects of the etching machine comprises: providing a test wafer, wherein the test wafer comprises a substrate (100), a first dielectric layer (200) and a second dielectric layer (300), the first dielectric layer (200) and the second dielectric layer (300) are sequentially formed on the top surface of the substrate (100), and a capacitive contact structure (400) is provided in the substrate (100) (S100); transferring the test wafer into an etching machine to be detected, and etching part of the second dielectric layer (300) and part of the first dielectric layer (200) so as to form a capacitance hole (S200); removing the second dielectric layer (300) so as to form a measurement wafer (S300); transferring the measurement wafer to a defect detection machine, and detecting the shape of the capacitance hole of the measurement wafer (S400); and according to the shape of the capacitance hole of the measurement wafer, determining whether the etching machine has an etching defect (S500). The method for detecting etching defects of the etching machine is simple and convenient, and may accurately determine whether the etching machine has an etching defect, thus improving the detection efficiency of the etching machine.

JP2004079164	MICRO-DRIVING MECHANISM AND METHOD FOR MANUFACTURING THE SAME, AND OPTICAL PICKUP HEAD FOR OPTICAL RECORDING AND REPRODUCING DEVICE HAVING MICRO-DRIVING MECHANISM AND METHOD FOR MANUFACTURING THE SAME
WO/2009/075442	NEAR-FIELD GAP PULL-IN METHOD AND OPTICAL DISC APPARATUS THEREFOR
JP3135389	METHOD AND DEVICE FOR RECORDING AND REPRODUCING INFORMATION

SUN YULE (CN)

PCT/CN2021/113357

July 28, 2022

August 18, 2021

Click for automatic bibliography generation  

CHANGXIN MEMORY TECH INC (CN)

G11B11/24; H01L21/8242

CN112902870A	2021-06-04
CN101211805A	2008-07-02
CN107689362A	2018-02-13
CN108717936A	2018-10-30
CN101990636A	2011-03-23
US20090140397A1	2009-06-04

BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)

View/Download PDF      PDF Help

Previous Patent: CHIP TESTING METHOD AND APPARATUS, AND ELECTRONIC DEVICE

Next Patent: MICROBIAL REMEDIATION AGENT WITH STRENGTH INCREASING WITH STRENGTH OF CONCRETE MATRIX AND PREPARATIO...