Title:
METHOD AND DEVICE FOR MANUFACTURING STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2021/044724
Kind Code:
A1
Abstract:
This method for manufacturing a structure comprises a step for subjecting an object to be etched to photoelectrochemical etching, the step comprising: a step in which an alkaline or acidic etching solution containing an electron-accepting oxidant is injected into a vessel in which an object -- at least a surface of which is composed of a Group III nitride and which is to be etched -- is held and which is held in a rotatable manner, so as to immerse the surface in the etching solution; a step in which, with the object to be etched and the etching solution being stationary, the surface of the object to be etched being held in the vessel is irradiated with light; and a step in which, after the surface is irradiated with light, the vessel is rotated to cause the etching solution to be scattered toward the outer periphery, thereby ejecting the etching solution out of the vessel.
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Inventors:
HORIKIRI FUMIMASA (JP)
FUKUHARA NOBORU (JP)
FUKUHARA NOBORU (JP)
Application Number:
PCT/JP2020/026456
Publication Date:
March 11, 2021
Filing Date:
July 06, 2020
Export Citation:
Assignee:
SCIOCS CO LTD (JP)
SUMITOMO CHEMICAL CO (JP)
SUMITOMO CHEMICAL CO (JP)
International Classes:
H01L21/3063
Foreign References:
| JP2005136002A | 2005-05-26 | |||
| JP2008527717A | 2008-07-24 | |||
| JP2018067689A | 2018-04-26 | |||
| JP2011146695A | 2011-07-28 | |||
| JP2004289032A | 2004-10-14 | |||
| JP2015170609A | 2015-09-28 | |||
| JP2007201014A | 2007-08-09 | |||
| JP2007305748A | 2007-11-22 |
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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