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Patent Searching and Data


Title:
METHOD AND DEVICE FOR SELECTING MATERIAL PROCESSING PATH
Document Type and Number:
WIPO Patent Application WO/2021/043007
Kind Code:
A1
Abstract:
Provided are a method and device for selecting a material processing path. The method comprises: obtaining a plurality of candidate material processing paths through calculation (101); determining bottleneck tanks (102), wherein the bottleneck tanks are tanks with the highest usage frequency among all tanks; and calculating a bottleneck tank utilization rate of each candidate material processing path among the plurality of candidate material processing paths, and selecting a candidate material processing path with the highest bottleneck tank utilization rate from among the plurality of candidate material processing paths to serve as a target material processing path (103). When routing control is carried out in the process of processing a plurality of materials, a target material processing path is calculated by taking both a processing duration and the utilization rate of a bottleneck tank, namely, a bottleneck resource, into consideration. Therefore, the processing processes of all the materials are completed within a short duration, and at the same time, bottleneck resources are fully utilized, thereby improving the production capacity of a processing apparatus.

Inventors:
CUI LIN (CN)
Application Number:
PCT/CN2020/110409
Publication Date:
March 11, 2021
Filing Date:
August 21, 2020
Export Citation:
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Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
G05B19/418
Foreign References:
CN101226870A2008-07-23
CN102789598A2012-11-21
CN110632902A2019-12-31
CN103116324A2013-05-22
CN103064380A2013-04-24
CN106707991A2017-05-24
EP0278774A21988-08-17
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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