Title:
METHOD FOR FORMING PATTERN, RADIATION-SENSITIVE COMPOSITION, AND CLATHRATE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2021/149432
Kind Code:
A1
Abstract:
Provided are: a method for forming a pattern using a novel pattern-forming material; a radiation-sensitive composition usable as the novel pattern-forming material; and a clathrate compound suitable for use as a component of such radiation-sensitive composition. An aspect of the present invention is a method for forming a pattern which comprises a step in which a radiation-sensitive composition comprising both a polymer having a host group and a first guest compound is used to form a coating film on a substrate, a step in which the coating film is exposed to light, and a step in which the exposed coating film is developed, wherein the host group is a monovalent group formed by removing one hydrogen atom or hydroxyl group from a cyclodextrin derivative.
Inventors:
SHIMOKAWA TSUTOMU (JP)
ICHINOHE DAIGO (JP)
ICHINOHE DAIGO (JP)
Application Number:
PCT/JP2020/047658
Publication Date:
July 29, 2021
Filing Date:
December 21, 2020
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F12/28; C08F20/58; G03F7/027; G03F7/20
Domestic Patent References:
WO2012036069A1 | 2012-03-22 | |||
WO2017159346A1 | 2017-09-21 | |||
WO2018207934A1 | 2018-11-15 |
Foreign References:
JP2005306917A | 2005-11-04 | |||
JP2019204719A | 2019-11-28 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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