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Patent Searching and Data


Title:
METHOD FOR FORMING A SILICON FILM AND INK COMPOSITION FOR INK JET
Document Type and Number:
WIPO Patent Application WO/2000/059014
Kind Code:
A1
Abstract:
A method for forming a silicon film which comprises discharging an ink composition (11) selectively onto a predetermined region of a substrate using an ink jet head (12) to form a pattern of a silicon precursor, and then subjecting the pattern to a treatment by heat and/or light to convert the silicon precursor to an amorphous silicon film or a poly-crystal silicon film. The method can be used for providing a silicon film pattern on a large area portion of a substrate with saving energy with a low cost.

Inventors:
SEKI SHUNICHI (JP)
SHIMODA TATSUYA (JP)
MIYASHITA SATORU (JP)
FURUSAWA MASAHIRO (JP)
YUDASAKA ICHIO (JP)
MATSUKI YASUO (JP)
TAKEUCHI YASUMASA (JP)
Application Number:
PCT/JP2000/001987
Publication Date:
October 05, 2000
Filing Date:
March 29, 2000
Export Citation:
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Assignee:
SEIKO EPSON CORP (JP)
JSR CORP (JP)
SEKI SHUNICHI (JP)
SHIMODA TATSUYA (JP)
MIYASHITA SATORU (JP)
FURUSAWA MASAHIRO (JP)
YUDASAKA ICHIO (JP)
MATSUKI YASUO (JP)
TAKEUCHI YASUMASA (JP)
International Classes:
C23C18/06; C23C18/08; C23C18/12; H01L21/208; H01L21/336; H01L31/18; H01L51/00; H01L51/40; (IPC1-7): H01L21/208; C01B33/02
Foreign References:
JPH10321536A1998-12-04
JPH03215941A1991-09-20
JPH088179A1996-01-12
JPH1179727A1999-03-23
JPH06191821A1994-07-12
JPH05144741A1993-06-11
Other References:
See also references of EP 1087428A4
Attorney, Agent or Firm:
Suzuki, Kisaburo (Owa 3-chome Suwa-shi, Nagano, JP)
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