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Title:
METHOD OF MAKING A PHOTOPOLYMER SLEEVE BLANK FOR FLEXOGRAPHIC PRINTING
Document Type and Number:
WIPO Patent Application WO2005110043
Kind Code:
A3
Abstract:
A method of making a photopolymer sleeve blank is provided which includes providing a base sleeve, applying a cushion layer over the base sleeve, and applying a first photopolymer layer over the cushion layer. The exterior­facing surface of the first photopolymer layer is exposed to a curing source, followed by the application of a second, uncured photopolymer layer over the first photopolymer layer. The first photopolymer layer is preferably ground to a predetermined thickness either before or after exposure to the curing source to provide a preferred floor dimension. The resulting photopolymer sleeve blank has a uniform floor which can be readily imaged and processed by conventional equipment used in the flexographic printing industry.

Inventors:
MCLEAN MICHAEL E (US)
SCHULZE-BAING DIETER (DE)
KOCKENTIEDT MICHAEL (DE)
GOSS WILL (US)
Application Number:
PCT/US2005/016212
Publication Date:
May 04, 2006
Filing Date:
May 09, 2005
Export Citation:
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Assignee:
DAY INT INC (US)
MCLEAN MICHAEL E (US)
SCHULZE-BAING DIETER (DE)
KOCKENTIEDT MICHAEL (DE)
GOSS WILL (US)
International Classes:
G03F7/18; G03C1/76; G03F7/16
Foreign References:
EP0766142A11997-04-02
EP1154322A12001-11-14
US4582777A1986-04-15
US4869997A1989-09-26
US6125753A2000-10-03
US5860360A1999-01-19
US20030157285A12003-08-21
EP1422567A22004-05-26
Other References:
PATENT ABSTRACTS OF JAPAN vol. 007, no. 286 (P - 244) 21 December 1983 (1983-12-21)
R. S. HORST, L. H. KAPLAN, D. P. MERRIT: "Resist Process", IBM TECHNICAL DISCLOURE BULLETIN, vol. 15, no. 1, June 1972 (1972-06-01), pages 46, XP002359205
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