Title:
METHOD FOR MANUFACTURING IMPRINT PATTERN FORMING COMPOSITION, METHOD FOR MANUFACTURING CURED PRODUCT, METHOD FOR MANUFACTURING IMPRINT PATTERN, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2022/054772
Kind Code:
A1
Abstract:
Provided are a method for manufacturing an imprint pattern forming composition, a method for manufacturing a cured product comprising the imprint pattern forming composition, a method for manufacturing an imprint pattern using the imprint pattern forming composition, and a device manufacturing method comprising the method for manufacturing an imprint pattern. The methods comprise a filtering step for filtering a precursor composition to obtain an imprint pattern forming composition. In the filtering step, the rate at which the precursor composition is passed through a filter does not exceed 0.9 cm per hour continuously for 10 seconds or longer.
Inventors:
HAKAMATA AKIHIRO (JP)
Application Number:
PCT/JP2021/032748
Publication Date:
March 17, 2022
Filing Date:
September 07, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02
Domestic Patent References:
| WO2020175301A1 | 2020-09-03 |
Foreign References:
| JP2013089761A | 2013-05-13 | |||
| JP2013074015A | 2013-04-22 | |||
| JP2012094821A | 2012-05-17 | |||
| JP2019145842A | 2019-08-29 |
Attorney, Agent or Firm:
SIKS & CO. (JP)
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