Title:
METHOD FOR MANUFACTURING TRANSPARENT, HEAT-RESISTANT GAS-BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2013/069725
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a transparent, heat-resistant gas-barrier film having good gas-barrier properties, not requiring large equipment or many steps, able to be manufactured simply and at low cost, and having good physical properties even when heat-processed at 250°C or higher. The method for manufacturing a transparent, heat-resistant gas-barrier film includes a step for applying a solution containing polysilazane to at least one side of a transparent polyimide film comprising a polyimide having a recurring unit of a specified structure, and then firing at a temperature of at least 180°C to laminate a silicon oxide layer.
Inventors:
SUENAGA SHUYA (JP)
MIKI YASUSHI (JP)
MIKI YASUSHI (JP)
Application Number:
PCT/JP2012/078959
Publication Date:
May 16, 2013
Filing Date:
November 08, 2012
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
B32B9/00; B32B18/00; B32B27/34; B32B37/00; B32B38/00; C08J7/044; C08J7/048
Domestic Patent References:
| WO2011074363A1 | 2011-06-23 |
Foreign References:
| JPH08112879A | 1996-05-07 | |||
| JPH09199740A | 1997-07-31 | |||
| JP2010100674A | 2010-05-06 | |||
| JP2006037079A | 2006-02-09 | |||
| JP2003141936A | 2003-05-16 | |||
| JP2006083209A | 2006-03-30 | |||
| JP2011074278A | 2011-04-14 | |||
| JP2009255040A | 2009-11-05 | |||
| JP2001111076A | 2001-04-20 | |||
| JP2009503157A | 2009-01-29 | |||
| JPH08281861A | 1996-10-29 | |||
| JP2007237588A | 2007-09-20 | |||
| JP2009255040A | 2009-11-05 |
Other References:
See also references of EP 2777929A4
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)
Tamotsu Otani (JP)
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Claims: