METHOD OF NANOSCALE PATTERNING BASED ON CONTROLLED PINHOLE FORMATION

Title:

METHOD OF NANOSCALE PATTERNING BASED ON CONTROLLED PINHOLE FORMATION

Document Type and Number:

WIPO Patent Application WO/2017/213016

Kind Code:

A1

Abstract:

A method of nanoscale patterning is disclosed. The method comprises: mixing predetermined amounts of a first solvent and a second solvent to generate a solvent, the first solvent and the second solvent being immiscible with each other; dissolving a solute material in the solvent to generate a coating material, the solute material having solubility that is higher in the first solvent than in the second solvent; and applying the coating material onto a substrate to form a plurality of pinholes in the coating material. The formation of the plurality of pinholes is associated with suspension drops mostly comprised of the second solvent, separated from the solute material dissolved in the first solvent, in the coating material. A method of making a stamp with a nanoscale pattern is also disclosed based on the above method.

Inventors:

QI YABING (JP)
ONO LUIS KATSUYA (JP)

Application Number:

PCT/JP2017/020439

Publication Date:

December 14, 2017

Filing Date:

June 01, 2017

Export Citation:

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Assignee:

OKINAWA INST SCIENCE & TECH SCHOOL CORP (JP)

International Classes:

B29C41/12; B29C59/02; B82Y40/00; H01L21/30; H01L51/48

Domestic Patent References:

WO2009041376A1

2009-04-02

Foreign References:

JP2015534721A

2015-12-03

Other References:

ZAFER HAWASH ET AL.: "Air-Exposure Induced Dopant Redistribution and Energy Level Shifts in Spin-Coated Spiro-MeOTAD Films", CHEMISTRY OF MATERIALS, vol. 27, 29 December 2014 (2014-12-29), pages 562 - 569, XP055331713