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Patent Searching and Data


Title:
METHOD FOR PATTERN FORMATION AND APPARATUS FOR PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2006/070791
Kind Code:
A1
Abstract:
This invention provides a method for pattern formation, characterized by comprising coating parts between partition lines for pattern formation formed on a surface of a base material with a resin composition for pattern formation having small compatibility or substantially no compatibility with a resin, which forms partition lines for pattern formation, in such a state that the base material on its surface with the partition lines for pattern formation formed thereon faces downward, maintaining the assembly in such a state that the resin composition for pattern formation is held on the downward faced surface of the base material to bring the resin composition for pattern formation between the partition lines for pattern formation into a downward convexed shape, and curing the resin composition for pattern formation having the downward convexed shape to form a pattern. There is also provided an apparatus for pattern formation.

Inventors:
YUMOTO YOSHIHIDE (JP)
Application Number:
PCT/JP2005/023868
Publication Date:
July 06, 2006
Filing Date:
December 27, 2005
Export Citation:
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Assignee:
GRAPAC JAPAN CO INC (JP)
YUMOTO YOSHIHIDE (JP)
International Classes:
B29D11/00; B05C1/02; B05C9/12; B05D5/06; G02B3/00
Foreign References:
JP2001301052A2001-10-30
JPH05303153A1993-11-16
JP2002353511A2002-12-06
JPH04165301A1992-06-11
JPS6252501A1987-03-07
Other References:
See also references of EP 1844921A4
None
Attorney, Agent or Firm:
Fukumura, Naoki (Yoyogi palace 21-10, Yoyogi 2-chom, Shibuya-ku Tokyo 53, JP)
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