Title:
METHOD FOR PHOTOLITHOGRAPHY TO MANUFACTURE TWO-SIDED TOUCH SENSOR
Document Type and Number:
WIPO Patent Application WO/2021/208738
Kind Code:
A1
Abstract:
A touch sensor having conductive circuits on both surfaces of a substrate is fabricated by including UV-blocking material into the substrate or depositing UV-blocking layer on the substrate. This can be used for fabricating sensors having transparent conductor circuits, or having metallic circuits, which are opaque to visible light. Photoresist is applied to both surfaces of the substrate and patterns are transferred to the photoresist by exposure to UV radiation. The UV-blocking layer prevents UV-radiation applied to one side from exposing the opposite side. If desired, both photoresist layers may be exposed simultaneously by splitting one UV beam.
Inventors:
ROUTH ROBERT (US)
MORRIONE MICHAEL (US)
HAWTHORNE JEFFREY (US)
MORRIONE MICHAEL (US)
HAWTHORNE JEFFREY (US)
Application Number:
PCT/CN2021/084505
Publication Date:
October 21, 2021
Filing Date:
March 31, 2021
Export Citation:
Assignee:
FUTURETECH CAPITAL INC (US)
JIANGSU XSIGNAL CO LTD (CN)
JIANGSU XSIGNAL CO LTD (CN)
International Classes:
G06F3/041; B32B7/02; H01B5/14
Foreign References:
| CN102639318A | 2012-08-15 | |||
| CN107358989A | 2017-11-17 | |||
| CN108920021A | 2018-11-30 | |||
| CN101726888A | 2010-06-09 | |||
| US20130241871A1 | 2013-09-19 |
Attorney, Agent or Firm:
CHANGZHOU BAIYETENGFEI PATENT AGENCY (GENERAL PARTNERSHIP) (CN)
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