Title:
METHOD FOR PREPARATION OF TARGET MATERIAL FOR SPATTERING
Document Type and Number:
WIPO Patent Application WO/1999/066098
Kind Code:
A1
Abstract:
A method for preparation of a target material for spattering, which comprises precipitating a noble metal or a noble metal alloy by electrolyzing a mixed molten salt comprising a noble metal salt and a solvent salt. The inventive method allows the simplification of a production process and also the production of a target material of high purity. Further, a target material having a markedly high purity can be prepared by subjecting the noble metal or noble metal alloy obtained by electrolytic precipitation to a heat treatment at a temperature higher than 800 °C and not higher than the melting point of the noble metal.
Inventors:
HARA NORIAKI (JP)
YARITA SOMEI (JP)
HAGIWARA KEN (JP)
MATSUZAKA RITSUYA (JP)
YARITA SOMEI (JP)
HAGIWARA KEN (JP)
MATSUZAKA RITSUYA (JP)
Application Number:
PCT/JP1999/003192
Publication Date:
December 23, 1999
Filing Date:
June 16, 1999
Export Citation:
Assignee:
TANAKA PRECIOUS METAL IND (JP)
HARA NORIAKI (JP)
YARITA SOMEI (JP)
HAGIWARA KEN (JP)
MATSUZAKA RITSUYA (JP)
HARA NORIAKI (JP)
YARITA SOMEI (JP)
HAGIWARA KEN (JP)
MATSUZAKA RITSUYA (JP)
International Classes:
C23C14/34; C25D3/66; C25D5/50; (IPC1-7): C23C14/34; C25D3/66; H01L21/285
Foreign References:
| US4274926A | 1981-06-23 | |||
| EP0286175A1 | 1988-10-12 | |||
| JPH0941131A | 1997-02-10 | |||
| JPH11158612A | 1999-06-15 |
Attorney, Agent or Firm:
Tanaka, Daisuke (Hongo 1-chome Bunkyo-ku Tokyo, JP)
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