Title:
METHOD FOR PRODUCING 1,3-BUTADIENE
Document Type and Number:
WIPO Patent Application WO/2021/044918
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a method for producing 1,3-butadiene, the method being capable of suppressing the generation of reaction by-products such as carbonyl compounds and organic acids. The method has: a step (A) for obtaining a product gas containing 1,3-butadiene through oxidative dehydrogenation of n-butene and oxygen; a step (B) for cooling the product gas obtained in the step (A); and a step (C) for separating the product gas cooled in the step (B) into molecular oxygen and inert gases, and other gases containing 1,3-butadiene, through the selective absorption of an absorption solvent, wherein in the step (A), a raw material gas and a molecular oxygen-containing gas are supplied to a fixed bed reactor having a composite oxide catalyst having molybdenum and bismuth, the molar ratio of the molecular oxygen and n-butene in the gas supplied to the fixed bed reactor is 1.0-2.0, and the molar ratio of water vapor and n-butene in the gas supplied to the fixed bed reactor is at most 1.2.
Inventors:
WANG JUNJIE (JP)
SASAKI YUICHIRO (JP)
MORI TAKASHI (JP)
SASAKI YUICHIRO (JP)
MORI TAKASHI (JP)
Application Number:
PCT/JP2020/032165
Publication Date:
March 11, 2021
Filing Date:
August 26, 2020
Export Citation:
Assignee:
JSR CORP (JP)
ENEOS CORP (JP)
ENEOS CORP (JP)
International Classes:
C07C5/48; C07B61/00; C07C11/167
Domestic Patent References:
| WO2014051090A1 | 2014-04-03 | |||
| WO2016140265A1 | 2016-09-09 | |||
| WO2015087668A1 | 2015-06-18 | |||
| WO2014168051A1 | 2014-10-16 |
Foreign References:
| JP2017524011A | 2017-08-24 | |||
| JP2016500372A | 2016-01-12 | |||
| JP2019151604A | 2019-09-12 |
Attorney, Agent or Firm:
FUJIMOTO Nobuo et al. (JP)
Download PDF:
Previous Patent: MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
Next Patent: 1,3-BUTADIENE PRODUCTION METHOD
Next Patent: 1,3-BUTADIENE PRODUCTION METHOD