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Patent Searching and Data


Title:
METHOD FOR PRODUCING DIARYLMETHANE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/262144
Kind Code:
A1
Abstract:
Provided is a method for producing a diarylmethane compound that brings a compound (I) represented by formula (I), a Lewis acid, and a reducing agent into contact in the presence of an indium compound to produce a diarylmethane compound represented by formula (II). In the formula, R1 shows a halogen atom, etc., n shows an integer of 0-5, X shows a group represented by -C(=O)- or -CH(-OR2)-, R2 shows a hydrogen atom, etc., and Ar shows an optionally substituted aromatic cyclic group or an optionally substituted aromatic heterocyclic group.

Inventors:
SEKI MASAHIKO (JP)
Application Number:
PCT/JP2020/023760
Publication Date:
December 30, 2020
Filing Date:
June 17, 2020
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Assignee:
TOKUYAMA CORP (JP)
International Classes:
C07C41/18; B01J27/12; B01J27/125; C07B61/00; C07C43/225
Foreign References:
JP2012500803A2012-01-12
CN105272960A2016-01-27
JP2010180143A2010-08-19
JP2011032174A2011-02-17
Other References:
MIYAI, TAKASHI ET AL.: "Novel synthetic usage of indium compounds as catalyst . Reductive deoxygenation of aryl ketones and sec-benzylic alcohols", SYNLETT, vol. 2, 1999, pages 182 - 184
Attorney, Agent or Firm:
KATO Ryuta et al. (JP)
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