Title:
METHOD FOR PRODUCING FRP PRECURSOR
Document Type and Number:
WIPO Patent Application WO/2022/054928
Kind Code:
A1
Abstract:
Provided is a method for producing an FRP precursor having a precoating step for applying a resin varnish having a filler content of 5 vol% or less in the solids fraction to a sheet-shaped aggregate and a melt pasting step for melt pasting a pair of resin films, each having a filler content of 30 vol% or higher, to both surfaces of the aggregate after the precoating step.
Inventors:
TOSAKA YUJI (JP)
SAITOH TAKESHI (JP)
YAMAGUCHI MASAKI (JP)
IWAKURA TETSURO (JP)
SHIMAYAMA YUICHI (JP)
MURAI KOSUKE (JP)
OJI MASASHI (JP)
SAITOH TAKESHI (JP)
YAMAGUCHI MASAKI (JP)
IWAKURA TETSURO (JP)
SHIMAYAMA YUICHI (JP)
MURAI KOSUKE (JP)
OJI MASASHI (JP)
Application Number:
PCT/JP2021/033402
Publication Date:
March 17, 2022
Filing Date:
September 10, 2021
Export Citation:
Assignee:
SHOWA DENKO MATERIALS CO LTD (JP)
International Classes:
B29B15/10; C08K3/013; C08L101/00; B29K105/10
Domestic Patent References:
WO2020040150A1 | 2020-02-27 | |||
WO2016178399A1 | 2016-11-10 | |||
WO2016178400A1 | 2016-11-10 |
Foreign References:
JPS5871123A | 1983-04-27 |
Other References:
"Spherical-Silica Fine Particles QSG Series", SILICONE CATALOG , 31 July 2015 (2015-07-31), Japan, pages 1 - 2, XP009535592
ANONYMOUS: "High-purity synthesis spherical silica", ADMATECHS CO., LTD, 19 April 2016 (2016-04-19), pages 1 - 3, XP055911963, Retrieved from the Internet [retrieved on 20220412]
SCIENTIFIC SYSTEMS RESEARCH GROUP: "Trends in Semiconductor Technology and Computer Technology", SCIENCE AND TECHNOLOGY COMPUTING SUBCOMMITTEE MATERIALS, 5 October 2006 (2006-10-05)
See also references of EP 4212302A4
ANONYMOUS: "High-purity synthesis spherical silica", ADMATECHS CO., LTD, 19 April 2016 (2016-04-19), pages 1 - 3, XP055911963, Retrieved from the Internet
SCIENTIFIC SYSTEMS RESEARCH GROUP: "Trends in Semiconductor Technology and Computer Technology", SCIENCE AND TECHNOLOGY COMPUTING SUBCOMMITTEE MATERIALS, 5 October 2006 (2006-10-05)
See also references of EP 4212302A4
Attorney, Agent or Firm:
OHTANI PATENT OFFICE (JP)
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