Title:
METHOD FOR PRODUCING MONOFLUOROMETHANE
Document Type and Number:
WIPO Patent Application WO/2021/241371
Kind Code:
A1
Abstract:
Provided is a production method capable of producing monofluoromethane by gas-phase flow without using a catalyst. The present invention is a method for producing monofluoromethane, the method comprising carrying out an electrical discharge in a continuously flowing mixed gas which contains a fluorine-containing inorganic compound, a compound represented by formula 1: CH3-R (where R is a hydrogen atom, a chlorine atom, a bromine atom, an iodine atom, or an organic group (other than a hydrocarbon group)), and an inert gas, and then continuously releasing the gas to outside an electrical discharge region.
Inventors:
MATSUURA GO (JP)
Application Number:
PCT/JP2021/019064
Publication Date:
December 02, 2021
Filing Date:
May 19, 2021
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C07C19/08; C07B61/00; C07C17/35; C07C17/361
Foreign References:
| US2785119A | 1957-03-12 | |||
| JPH02131116A | 1990-05-18 | |||
| JP2001054721A | 2001-02-27 | |||
| JP2013006786A | 2013-01-10 | |||
| JP2017155005A | 2017-09-07 |
Other References:
TRUESDALE, E. A. ET AL.: "The effect of added hydrogen on the rf discharge chemistry of tetrafluoromethane, trifluoromethane and hexafluoroethane", JOURNAL OF APPLIED PHYSICS, vol. 50, no. 11, 1979, pages 6594 - 6599, XP055879588
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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