Title:
METHOD FOR PRODUCING NANOIMPRINT MOLD
Document Type and Number:
WIPO Patent Application WO/2018/105353
Kind Code:
A1
Abstract:
A method for producing a replica mold for nanoimprinting, which uses, as a coating film material, a photocurable composition that contains a polymerizable monomer, a silicon compound and a photopolymerization initiator, said replica mold being composed of a laminate that comprises a base material layer and a pattern layer. This method for producing a replica mold for nanoimprinting is characterized in that a laminate having a photocured film surface of the coating film material, which is directly or indirectly formed on the base material layer and has a pattern transferred by means of a mold, is subjected to a plasma atmosphere in the presence of H2O, and is subsequently reacted with a silane coupling agent for mold release.
Inventors:
TAMARI NAOKI (JP)
Application Number:
PCT/JP2017/041323
Publication Date:
June 14, 2018
Filing Date:
November 16, 2017
Export Citation:
Assignee:
STANLEY ELECTRIC CO LTD (JP)
International Classes:
B29C59/02; B29C33/40
Domestic Patent References:
| WO2014168237A1 | 2014-10-16 |
Foreign References:
| JP2015131481A | 2015-07-23 | |||
| JP2015037169A | 2015-02-23 | |||
| JP2008207475A | 2008-09-11 |
Attorney, Agent or Firm:
LEXT, P.C. (JP)
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