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Title:
METHOD FOR PRODUCING REACTION GAS CONTAINING 1,1,2-TRIFLUOROETHANE (R-143) AND/OR (E, Z)-1,2-DIFLUOROETHYLENE (R-1132 (E, Z))
Document Type and Number:
WIPO Patent Application WO/2022/131349
Kind Code:
A1
Abstract:
The present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E, Z)-1,2-difluoroethylene (R-1132 (E, Z)) by using a starting material that is more easily available than the starting material used in conventional methods. The present disclosure specifically provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E, Z)-1,2-difluoroethylene (R-1132 (E, Z)), the method comprising a step in which the reaction gas is obtained by subjecting a starting material gas that contains difluoromethane (R-32) to a reaction including thermal decomposition under pressure conditions of 0.6 MPaG to 2.0 MPaG at a temperature of 600°C to 1000°C.

Inventors:
TAKAKUWA TATSUYA (JP)
OTSUKA TOMO (JP)
NOGUCHI ATSUSHI (JP)
HASUMOTO YUUTA (JP)
Application Number:
PCT/JP2021/046641
Publication Date:
June 23, 2022
Filing Date:
December 16, 2021
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C07C19/08; C07C17/269; C07C21/18
Domestic Patent References:
WO2020246611A12020-12-10
WO2019216239A12019-11-14
WO2017104828A12017-06-22
Foreign References:
JP2013241348A2013-12-05
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
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