Title:
METHOD AND SYSTEM FOR SILICON MICROLENS CLEANING
Document Type and Number:
WIPO Patent Application WO2000031527
Kind Code:
A3
Abstract:
A method and system for cleaning the silicon microlenses (100) in an electron-beam microcolumn in situ. The microlenses individually are heated by passing a current (I) through each microlens. The current is utilized to heat the microlens to at least two hundred degrees Centigrade to prevent contamination and occasionally to a temperature on the order of six to seven hundred degrees Centigrade to remove any builtup or potential contamination.
Inventors:
CHANG T H PHILLIP
KIM HO-SEOB
KIM HO-SEOB
Application Number:
PCT/US1999/025510
Publication Date:
October 19, 2000
Filing Date:
October 29, 1999
Export Citation:
Assignee:
ETEC SYSTEM INC (US)
International Classes:
G01N13/12; G01N30/00; G12B21/00; H01J37/12; H01J37/26; G01N; (IPC1-7): H01J37/12
Foreign References:
| US4427886A | 1984-01-24 | |||
| US5563415A | 1996-10-08 |
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