Title:
METHODS, SYSTEMS, AND ARTICLES FOR PRODUCING A FILM PATTERN ON A SUBSTRATE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2021/027837
Kind Code:
A1
Abstract:
Aspects herein are directed to systems, methods, and articles for producing a patterned film and using the patterned film to form a pattern of discrete overlay film structures on a substrate material. A uniform thickness of a film material is deposited on to a first surface of a run of carrier sheets, where each carrier sheet includes one or more holes extending there through. A first carrier sheet is extracted from the run of carrier sheets, and a second surface of the carrier sheet is positioned on a substrate material. Heat and/or pressure is applied to the film material to cause the film material to transfer to the substrate material through the one or more holes in the carrier sheet forming a pattern of discrete overlay film structures on the substrate material. The carrier sheet along with remaining portions of the film material is removed from the substrate material.
Inventors:
JANES CODY EVIN (US)
MORGAN DANIEL P (US)
OU YANG-HUA (US)
SCHEPKE KYLE (US)
WILLIAMS JOSHUA PATRICK (US)
ZHU XIAOJUN (CN)
MORGAN DANIEL P (US)
OU YANG-HUA (US)
SCHEPKE KYLE (US)
WILLIAMS JOSHUA PATRICK (US)
ZHU XIAOJUN (CN)
Application Number:
PCT/CN2020/108643
Publication Date:
February 18, 2021
Filing Date:
August 12, 2020
Export Citation:
Assignee:
NIKE INNOVATE CV (US)
NIKE INC (US)
NIKE INC (US)
International Classes:
A41H43/00; A41D27/08
Foreign References:
| US20180195216A1 | 2018-07-12 | |||
| CN102613730A | 2012-08-01 | |||
| CN103519427A | 2014-01-22 | |||
| CN108471823A | 2018-08-31 | |||
| JP2002338908A | 2002-11-27 | |||
| US20180049698A1 | 2018-02-22 |
Attorney, Agent or Firm:
AFD CHINA INTELLECTUAL PROPERTY LAW OFFICE (CN)
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