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Patent Searching and Data


Title:
MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/228543
Kind Code:
A1
Abstract:
Disclosed is an MEMS device, comprising a substrate, and a first sacrificial layer (200), a first conductive film (300), a second sacrificial layer (400) and a second conductive film (500) that are stacked on the substrate (100) in sequence, wherein the second sacrificial layer (400) is provided with a cavity (410). The MEMS device further comprises an amplitude limiting layer provided with a first through hole, and an isolation layer provided with a second through hole, wherein the amplitude limiting layer and the isolation layer that are arranged in a stacked manner are jointly located between the first conductive film (300) and the first sacrificial layer (200), and/or the amplitude limiting layer and the isolation layer are located on the second conductive film (500), with the isolation layer being located between the amplitude limiting layer and the second conductive film (500), and the amplitude limiting layer extending to a projection area of an opening of the cavity and being in a suspended state.

Inventors:
HU YONGGANG (CN)
ZHOU GUOPING (CN)
XIA CHANGFENG (CN)
Application Number:
PCT/CN2020/087979
Publication Date:
November 19, 2020
Filing Date:
April 30, 2020
Export Citation:
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Assignee:
CSMC TECHNOLOGIES FAB2 CO LTD (CN)
International Classes:
H04R19/04
Foreign References:
CN204031449U2014-12-17
CN104105041A2014-10-15
CN206061135U2017-03-29
CN103702269A2014-04-02
CN107404698A2017-11-28
CN103402163A2013-11-20
US20180362332A12018-12-20
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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