MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURING METHOD, AND MICRO-NANO STRUCTURE ASSEMBLY MANUFACTURED BY MEANS OF SAME

WIPO Patent Application WO/2021/082051

A1

A method for manufacturing a micro-nano structure assembly, comprising: providing a filter membrane; providing an MEMS sensor, wherein the MEMS sensor is provided with an opening and can perform sensing by means of the opening; and bonding the filter membrane onto the MEMS sensor, so that the filter membrane covers the opening. The method for providing the filter membrane comprises: coating a substrate (108) with a filter membrane material layer (107), and then coating the filter membrane material layer with a photoresist layer (106); heating the substrate (108) to soften the photoresist layer; using a mold to pressurize the substrate (108), wherein the mold consists of a pattern layer (104) and a back layer (102) that are superimposed, and the back layer is pressurized to make the pattern layer be in contact with the photoresist layer; when continuously using the mold to pressurize the photoresist layer, cooling the photoresist layer to solidify the photoresist layer so as to form, on the photoresist layer, a pattern conforming to the pattern layer; removing the mold; by means of dry etching, removing a photoresist remaining on the pattern; and using the photoresist layer as a mask to perform dry etching or wet etching on the filter membrane material layer (107) so as to transfer the pattern of the photoresist layer onto the filter membrane material layer.

LIN YUJING (CN)

PCT/CN2019/116565

May 06, 2021

November 08, 2019

Click for automatic bibliography generation  

WEIFANG GOERTEK MICROELECTRONICS CO LTD (CN)

H04R19/00

CN106744664A	2017-05-31
CN104760924A	2015-07-08
CN102740207A	2012-10-17
CN105359552A	2016-02-24
US20080248333A1	2008-10-09

View/Download PDF      PDF Help

Previous Patent: ORGANIC LIGHT-EMITTING DIODE DEVICE AND FABRICATION METHOD THEREFOR

Next Patent: MICROFILTER AND MEMS SENSOR ASSEMBLY