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Title:
MONOMER COUPLED WITH THERMAL ACID GENERATOR, POLYMER GAINED FROM MONOMER COUPLED WITH THERMAL ACID GENERATOR, COMPOSITION FOR RESIST UNDERLAYER FILM INCLUDING POLYMER, AND METHOD FOR FORMING PATTERN USING COMPOSITION FOR RESIST UNDERLAYER FILM
Document Type and Number:
WIPO Patent Application WO/2013/062255
Kind Code:
A2
Abstract:
A composition for a resist underlayer film including a thermal acid generator, a polymer gained from a monomer coupled with a thermal acid generator, a composition for a resist underlayer film including the polymer, and a method for forming a pattern using the composition for the resist underlayer film.

Inventors:
KWON HYO-YOUNG (KR)
SHIN SEUNG-WOOK (KR)
LEE SUNG-JAE (KR)
CHO YOUN-JIN (KR)
Application Number:
PCT/KR2012/008314
Publication Date:
May 02, 2013
Filing Date:
October 12, 2012
Export Citation:
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Assignee:
CHEIL IND INC (KR)
International Classes:
C07C309/29; C07C309/04; C08G61/12; G03F7/00; G03F7/26
Foreign References:
JP2011118310A2011-06-16
US20070149702A12007-06-28
Other References:
WANG, M. ET AL.: 'Novel anionic photoacid generators(PAGs) and corresponding PAG bound polymer for sub-50 nm EUV lithography' J. MATER, CHEM. vol. 17, 2007, pages 1699 - 1706
GONSALVES, K.E. ET AL.: 'Novel chemically amplifed resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch litography' J. MATER, CHEM. vol. 19, 2009, pages 2797 - 2802
Attorney, Agent or Firm:
PANKOREA PATENT AND LAW FIRM (KR)
팬코리아 특허법인 (KR)
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Claims: