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Title:
MULTI-ELECTRON BEAM INSPECTION DEVICE AND MULTI-ELECTRON BEAM INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/205729
Kind Code:
A1
Abstract:
A multi-electron beam inspection device (100) according to one aspect of the present invention is characterizing by comprising: a multi-detector (222) having a plurality of detection sensors for detecting, among multi-secondary electron beams (300) emitted due to the irradiation of a sample (105) with multi-primary electron beams (20), secondary electron beams respectively emitted due to the irradiation of the sample with preset primary electron beams; and a reference image data creation circuit (112) which creates reference image data at a position irradiated with each primary electron beam, on the basis of design data that is the basis of the pattern formed on the sample; a synthesis circuit (132) which synthesizes, for each primary electron beam, a part of the reference image data on the position irradiated with the primary electron beam with reference image data on a position irradiated with a primary electron beam different from the primary electron beam; and a comparison circuit (108) which compares the synthesized synthetic reference image data with the secondary electron image data based on the value detected by the detection sensor that detects the secondary electron beam caused by the irradiation of the primary electron beam.

Inventors:
OGAWA RIKI (JP)
HIRANO RYOICHI (JP)
SUGIHARA SHINJI (JP)
INOUE HIROMU (JP)
Application Number:
PCT/JP2021/003885
Publication Date:
October 14, 2021
Filing Date:
February 03, 2021
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Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/22; G01N23/2251; H01J37/244; H01J37/28; H01L21/66
Domestic Patent References:
WO2006093268A12006-09-08
WO2019053174A12019-03-21
Foreign References:
JP2007019034A2007-01-25
JP2010519697A2010-06-03
JP2008233723A2008-10-02
JPH02147883A1990-06-06
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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