Title:
MULTIELECTRON BEAM INSPECTION DEVICE AND MULTIELECTRON BEAM INSPECTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/205728
Kind Code:
A1
Abstract:
A multielectron beam inspection device (100) of an embodiment of the present invention is characterized by being provided with: a secondary-electron image acquisition mechanism (150) for irradiating a sample (101) having a pattern formed thereon with a multi-primary-electron beam (20), detecting a multi-secondary-electron beam (300) emitted due to the irradiation of the sample with the multi-primary-electron beam, and acquiring a secondary-electron image containing a crosstalk component; a correction circuit (132) for generating a corrected secondary-electron image obtained by removing the crosstalk component from the secondary-electron image by using preset gain information with which to remove the crosstalk component from the secondary-electron image; and a comparison circuit (108) for comparing the corrected secondary-electron image with a predetermined image (123).
Inventors:
OGAWA RIKI (JP)
HIRANO RYOICHI (JP)
SUGIHARA SHINJI (JP)
INOUE HIROMU (JP)
HIRANO RYOICHI (JP)
SUGIHARA SHINJI (JP)
INOUE HIROMU (JP)
Application Number:
PCT/JP2021/003884
Publication Date:
October 14, 2021
Filing Date:
February 03, 2021
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/22; G01N23/2251; H01J37/244; H01J37/28; H01L21/66
Foreign References:
| JP2018513543A | 2018-05-24 | |||
| JPH02147883A | 1990-06-06 | |||
| JP2003132834A | 2003-05-09 |
Attorney, Agent or Firm:
IKEGAMI, Tetsuma et al. (JP)
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