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Patent Searching and Data


Title:
NANOIMPRINT METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2007/020962
Kind Code:
A1
Abstract:
Provided is a nanoimprint method for transferring a pattern formed on the surface of a mold, to a transfer layer formed on the partial or whole surface of a substrate of a generally cylindrical or columnar shape. Also provided is a nanoimprint apparatus comprising a first jig for contacting with the substrate, a second jig for supporting the first jig rotatably, a pushing portion connected to the second jig for pushing the substrate onto the mold through the first jig and the second jig, and a movable holding portion for holding the mold and for moving the mold in a direction generally perpendicular to the pushing force. The apparatus transfers a pattern formed on the surface of the mold, to a transfer layer formed on the partial or whole side face of the generally cylindrical or columnar substrate.

Inventors:
NAKAMURA KAZUYA (JP)
IMAIZUMI NOBUO (JP)
HIYAMA YOSHIHITO (JP)
MAEDA RYUTARO (JP)
GOTO HIROSHI (JP)
Application Number:
PCT/JP2006/316144
Publication Date:
February 22, 2007
Filing Date:
August 17, 2006
Export Citation:
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Assignee:
NAMIKI PRECISION JEWEL CO LTD (JP)
NAKAMURA KAZUYA (JP)
IMAIZUMI NOBUO (JP)
HIYAMA YOSHIHITO (JP)
MAEDA RYUTARO (JP)
GOTO HIROSHI (JP)
International Classes:
B82B3/00; B29C33/38; B29C59/04; B81C99/00; H01L21/027; H05K3/10
Foreign References:
JP2000147229A2000-05-26
JP2000141481A2000-05-23
JP2003001706A2003-01-08
JP2005012040A2005-01-13
JPH08276494A1996-10-22
JPH05222504A1993-08-31
JP2002001812A2002-01-08
JP2003025431A2003-01-29
JPH10109314A1998-04-28
JP2004288845A2004-10-14
Other References:
TAN H. ET AL.: "Roller nanoimprint lithography", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY. B, AMERICAN VACUUM SOCIETY, vol. 16, no. 6, 1998, pages 3926 - 3928, XP012007312
Attorney, Agent or Firm:
NAMIKI SEIMITSU HOUSEKI KABUSHIKIKAISHA (Shinden 3-Chome Adachi-ku Tokyo, 11, JP)
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