Title:
NANOWIRE-EQUIPPED FILM AND NANOWIRE PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2021/140835
Kind Code:
A1
Abstract:
Provided are a nanowire-equipped film in which nanowire is directly grown on a substrate, and a nanowire production method in which nanowire is grown directly on a substrate. Specifically, the nanowire-equipped film comprises a substrate made from a crystalline resin and nanowire made from a metal oxide directly grown on the substrate, and a fine rugged structure is formed on a surface of the substrate, and the nanowire is directly grown from said rugged structure. Alternatively, the present invention comprises a substrate made from a non-crystalline resin and nanowire made from a metal oxide directly grown on the substrate, and a fine rugged structure having a pitch of 2-100 nm and a depth of 5-30 nm is formed on a surface of the substrate, and the nanowire is directly grown from said rugged structure.
Inventors:
IKEDA MUNEKAZU (JP)
HIRATA HAJIME (JP)
HIRATA HAJIME (JP)
Application Number:
PCT/JP2020/046475
Publication Date:
July 15, 2021
Filing Date:
December 14, 2020
Export Citation:
Assignee:
TORAY ENG CO LTD (JP)
International Classes:
B82B1/00; B32B3/30; B32B5/02; B32B9/00; B32B27/12; B82Y30/00; B82Y40/00; C01G9/02; D01F9/08
Foreign References:
| JP2013216548A | 2013-10-24 | |||
| JP2013006761A | 2013-01-10 | |||
| JP2009021400A | 2009-01-29 | |||
| US20130136995A1 | 2013-05-30 | |||
| JP2009500275A | 2009-01-08 | |||
| JP6724265B1 | 2020-07-15 |
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