NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM

Title:

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN STRUCTURE AND METHOD FOR PRODUCING PATTERNED CURED FILM

Document Type and Number:

WIPO Patent Application WO/2021/187324

Kind Code:

A1

Abstract:

The present invention provides a novel photosensitive resin composition, specifically a negative photosensitive resin composition which is based on a polysiloxane. This negative photosensitive resin composition contains (A) a polysiloxane compound which contains a first constituent unit represented by general formula (1), (B) a photo-inducible curing accelerator and (C) a solvent.　(1): ((Rx)bRl mSiOn/2) (In general formula (1), Rx represents a monovalent group represented by general formula (1a); Rl represents a substituent that is selected from the group consisting of a hydrogen atom, an alkyl group having from 1 to 3 carbon atoms, a phenyl group, a hydroxy group, an alkoxy group having from 1 to 3 carbon atoms, and a fluoroalkyl group having from 1 to 3 carbon atoms; b represents a number from 1 to 3; m represents a number that is not less than 0 but less than 3; n represents a number that is more than 0 but not more than 3; (b + m + n) = 4; and in cases where there are a plurality of Rx moieties and a plurality of Rl moieties, each of those moieties independently represents one of the constituents. In general formula (1a), X represents a hydrogen atom; a represents a number from 1 to 5; and the broken line represents a bonding hand.)

More Like This:

WO/2014/136893	FLUORINE-CONTAINING NANO-SILICA COMPOSITE PARTICLES AND PREPARATION METHOD THEREFOR
WO/2011/071599	PROCESS FOR PREPARATION OF FLUOROSILICON POLYMER
WO/2006/010666	BLOCK CONDENSATES OF ORGANOFUNCTIONAL SILOXANES,THEIR PREPARATION AND USE, AND THEIR PROPERTIES

Inventors:

MASUBUCHI TAKASHI (JP)
OIKAWA YURI (JP)
YAMANAKA KAZUHIRO (JP)
YOTSUMOTO RIKAKO (JP)

Application Number:

PCT/JP2021/009868

Publication Date:

September 23, 2021

Filing Date:

March 11, 2021

Export Citation:

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Assignee:

CENTRAL GLASS CO LTD (JP)

International Classes:

C08G77/24; G03F7/004; G03F7/038; G03F7/075; G03F7/20; G03F7/40

Foreign References:

JP2015129908A	2015-07-16
JP2014156461A	2014-08-28
JP2008203612A	2008-09-04

Attorney, Agent or Firm:

TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC. (JP)

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