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Title:
NEGATIVE RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2021/200009
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a negative resist composition useful in the manufacture of color filters with high transmittance of light with a wavelength of 440 nm.　This negative resist composition includes a colorant and a resin; the colorant contains a xanthene dye; and the dispersion spectrum of a cured film formed from the negative resist composition fulfills condition 1 below.　[Condition 1] The wavelength of maximum absorption is in the wavelength range 500–580 nm, and, if the transmittance at that wavelength is 5%, the transmittance at a wavelength of 440 nm is at least 80% and the transmittance at a wavelength of 620 nm is at least 80%.

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Inventors:
NAKAYAMA TOMOHIRO (JP)
AKASAKA TETSUO (JP)
AOKI TAKUMA (JP)
MIYAZAWA TAKU (JP)
Application Number:
PCT/JP2021/009752
Publication Date:
October 07, 2021
Filing Date:
March 11, 2021
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
G03F7/004; C09B11/28; G02B5/20; G03F7/027
Domestic Patent References:
WO2017192973A12017-11-09
Foreign References:
JP2006195479A2006-07-27
JP2010191304A2010-09-02
JP2017182044A2017-10-05
JP2018141173A2018-09-13
JP2019109487A2019-07-04
JPS60166318A1985-08-29
JPH0675372A1994-03-18
JPH0675373A1994-03-18
JPS4838403A1973-06-06
JPS62174204A1987-07-31
JPH0710913A1995-01-13
Other References:
"Experimental Method for Polymer Synthesis", 1 March 1972, KAGAKU DOJIN PUBLISHING CO
CHUN LIUXIAOXIAO SONGQIJIAN NIJIESHAN QIU, ARKIVOC, vol. 9, 2012, pages 62 - 75
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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