NON-VOLATILE MULTI-LEVEL OPTICAL MEMORY USING POLYDIMETHYLSILOXANE, AND MANUFACTURING METHOD THEREFOR

Title:

NON-VOLATILE MULTI-LEVEL OPTICAL MEMORY USING POLYDIMETHYLSILOXANE, AND MANUFACTURING METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2021/091020

Kind Code:

A1

Abstract:

The present embodiments provide: a non-volatile multi-level optical memory which can be operated at multiple levels by means of one gate, as a result of forming an interface trap between a channel and a gate insulator by means of a viscous organic residue, and varying light wavelengths; and a manufacturing method therefor.

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Inventors:

KIM HYUN JAE (KR)
PARK KYUNG HO (KR)
LEE JIN HYUK (KR)
KIM HEE JUN (KR)
KIM DONG WOO (KR)
MIN WON KYUNG (KR)
RHO SUNG MIN (KR)

Application Number:

PCT/KR2020/001066

Publication Date:

May 14, 2021

Filing Date:

January 22, 2020

Export Citation:

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Assignee:

UNIV INDUSTRY FOUNDATION UIF YONSEI UNIV (KR)

International Classes:

H01L27/11568; H01L29/66; H01L29/78

Foreign References:

KR101757107B1	2017-07-12
KR20130014155A	2013-02-07
KR20160011741A	2016-02-02
US20050072989A1	2005-04-07
KR20080022024A	2008-03-10

Attorney, Agent or Firm:

WOOIN PATENT & LAW FIRM (KR)

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