Title:
NONWOVEN FABRIC AND METHOD FOR MANUFACTURING NONWOVEN FABRIC
Document Type and Number:
WIPO Patent Application WO/2021/199717
Kind Code:
A1
Abstract:
Provided are a nonwoven fabric of a large basis weight, and a method for manufacturing the nonwoven fabric. At a nonwoven fabric manufacturing facility (15), a fiber (11) formed by applying a voltage between a solution (23a) and a collector (52) and jetting out the solution (23a) through a nozzle (25a) is captured by the collector (52) to acquire a nonwoven fabric (10). The electrical conductivity of the solution (23a) is within a range of more than 2 mS/m but less than 50 mS/m. A conductive liquid (31a) is adhered to the fiber (11). The manufactured nonwoven fabric (10) has an average fiber diameter within a range of 10 nm-2000 nm, a porosity of 90% or higher, and a basis weight within a range of 120-2000 g/m2.
Inventors:
NAKAGAWA YOSUKE (JP)
KANEMURA KAZUHIDE (JP)
KANEMURA KAZUHIDE (JP)
Application Number:
PCT/JP2021/005336
Publication Date:
October 07, 2021
Filing Date:
February 12, 2021
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
D04H1/4382; D01D5/04; D01F1/02; D01F2/00; D01F2/28; D04H1/4258; D04H1/728
Domestic Patent References:
| WO2020050311A1 | 2020-03-12 | |||
| WO2019187827A1 | 2019-10-03 | |||
| WO2018147068A1 | 2018-08-16 |
Foreign References:
| JP2007092213A | 2007-04-12 | |||
| JPH05279946A | 1993-10-26 | |||
| JP2019077964A | 2019-05-23 |
Attorney, Agent or Firm:
KYORITSU INSTITUTE (JP)
Download PDF:
Previous Patent: COMMUNICATION DEVICE, CONTROL METHOD, AND PROGRAM
Next Patent: SECONDARY FLOW SUPPRESSION STRUCTURE
Next Patent: SECONDARY FLOW SUPPRESSION STRUCTURE