NOVEL PHOTOSENSITIVE BILAYER COMPOSITION

Title:

NOVEL PHOTOSENSITIVE BILAYER COMPOSITION

Document Type and Number:

WIPO Patent Application WO2005022257

Kind Code:

A3

Abstract:

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure (I), where R

Inventors:

FOSTER PATRICK (US)
SPAZIANO GREGORY (US)
DE BINOD B (US)

Application Number:

PCT/US2004/026979

Publication Date:

December 01, 2005

Filing Date:

August 19, 2004

Export Citation:

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Assignee:

ARCH SPEC CHEM INC (US)

International Classes:

C08F24/00; C08F30/08; C08F220/18; C08F222/06; C08F230/08; G03C1/76; G03F7/039; G03F7/075; G03F7/09; G03F7/20; G03F7/30; G03F7/36; G03F7/004; G03F; (IPC1-7): G03F7/039; G03F7/09; G03F7/20; G03F7/30; G03F7/36; C08F24/00; C08F30/08

Other References:

CHEMICAL ABSTRACTS, Columbus, Ohio, US; abstract no. 1989:440010, KASHUNTINA E.A. ET AL: "Synthesis and Properties of Copolymers of beta-substituted Oxadisilacyclohexanes with Octamethylcyclotetrasiloxane." XP008055340

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