Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2021/034014
Kind Code:
A1
Abstract:
Provided is a novel silylcyclodisilazane compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing the silicon-containing thin film using the same, and since the silylcyclodisilazane compound of the present invention has high reactivity, thermal stability and high volatility, it can be used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film by various deposition methods.

Inventors:
JANG SE JIN (KR)
KIM SUNG GI (KR)
PARK JEONG JOO (KR)
BYUN TAE SEOK (KR)
KWONE YONG HEE (KR)
KIM YEONG HUN (KR)
LIM HAENGDON (KR)
JEON SANG YONG (KR)
LEE SANG ICK (KR)
Application Number:
KR2020/010771
Publication Date:
February 25, 2021
Filing Date:
August 13, 2020
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DNF CO LTD (KR)
International Classes:
C07F7/21; C23C16/40; C23C16/455
Domestic Patent References:
WO2017023693A12017-02-09
Foreign References:
US20160326193A12016-11-10
US20050163927A12005-07-28
Other References:
A. M. WROBEL, I. BLASZCZYK-LEZAK, A. WALKIEWICZ-PIETRZYKOWSKA, T. AOKI, J. KULPINSKI: "Hard and High-Temperature-Resistant Silicon Carbonitride Coatings Based on N-Silyl-Substituted Cyclodisilazane Rings", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 4, 1 January 2008 (2008-01-01), pages K66, XP055598656, ISSN: 0013-4651, DOI: 10.1149/1.2838067
WROBEL, A. M.: "Surface free energy of plasma-deposited thin polymer films", PHYSICOCHEMICAL ASPECTS OF POLYMER SURFACES : [PROCEEDINGS OF THE INTERNATIONAL SYMPOSIUM ON PHYSICOCHEMICAL ASPECTS OF POLYMER SURFACES HELD AS PART OF THE AMERICAN CHEMICAL SOCIETY MEETING, AUGUST 23 - 28, 1981, IN NEW YORK CITY, NEW YORK], vol. 1, 1983, Boston, MA., US, pages 197 - 215, XP009526332, DOI: 10.1007/978-1-4615-7584-9_12
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
Download PDF: