Title:
NOVOLAC RESIN, EPOXY RESIN, PHOTOSENSITIVE RESIN COMPOSITION, CURABLE RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC DEVICE, METHOD FOR PRODUCING NOVOLAC RESIN, AND METHOD FOR PRODUCING EPOXY RESIN
Document Type and Number:
WIPO Patent Application WO/2021/193878
Kind Code:
A1
Abstract:
This novolac resin has a partial structure represented by -C(CF3)H-. This photosensitive resin composition contains the novolac resin and a photosensitizer. This epoxy resin has a partial structure represented by -C(CF3)H-. This curable resin composition contains the novolac resin or the epoxy resin. This cured product is obtained by curing the composition. In this method for producing a novolac resin, a novolac resin having a partial structure represented by -C(CF3)H- is produced by reacting an aromatic compound and fluoral in the presence of an acid catalyst. This method for producing an epoxy resin includes an epoxidation step in which a novolac resin having a partial structure represented by -C(CF3)H- is reacted in the presence of an epihalohydrin and a base.
Inventors:
HIROTAKI KENSUKE (JP)
HARA YUKARI (JP)
AOKI TAKASHI (JP)
NAGURA HIROKATSU (JP)
HOSOI KENJI (JP)
HARA YUKARI (JP)
AOKI TAKASHI (JP)
NAGURA HIROKATSU (JP)
HOSOI KENJI (JP)
Application Number:
PCT/JP2021/012741
Publication Date:
September 30, 2021
Filing Date:
March 25, 2021
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C08F299/02; C07B61/00; C08G8/04; C08G8/28; C08G59/02; C08G59/30; G03F7/023
Foreign References:
JP2017102420A | 2017-06-08 | |||
JPS6445423A | 1989-02-17 | |||
JP2002198283A | 2002-07-12 | |||
JPS61111319A | 1986-05-29 | |||
JP6319582B2 | 2018-05-09 | |||
JP6206445B2 | 2017-10-04 | |||
JPH022885B2 | 1990-01-19 | |||
JPH0597757A | 1993-04-20 | |||
JPH03184933A | 1991-08-12 | |||
JP2020057369A | 2020-04-09 | |||
JP2020078271A | 2020-05-28 | |||
JP2020164681A | 2020-10-08 |
Attorney, Agent or Firm:
HAYAMI Shinji (JP)
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