OPTICAL FILTER AND PRODUCTION METHOD THEREFOR, OPTICAL SENSOR, AND SOLID-STATE IMAGING ELEMENT

WIPO Patent Application WO/2021/161961

A1

Provided are an optical sensor and a solid-state imaging element in which a plurality of optical filters having different optical characteristics can be integrally formed, and which are capable of independently and simultaneously detecting light beams having specific wavelengths ranging at least from the visible light range to the infrared light range.　At least two filter regions 11, 12 that selectively transmit light beams having different wavelengths are formed on the same plane. The filter regions 11, 12 are formed by an intermediate layer 13 located at the center in the thickness direction, and dielectric laminate films 14, 15 formed on the light-entering side and the light-exiting side of the intermediate layer 13. The dielectric laminate films 13, 14 have a structure in which first dielectric layers 10L of a dielectric material and a second dielectric layers 10H of a dielectric material having a refractive index higher than that of the first dielectric layer 10Ls are alternately layered. The intermediate layer 13 has a different thickness between the filter regions 11, 12. In at least the dielectric laminate film 14 on the light-exiting side, the first dielectric layers 10L and the second dielectric layers 10H are continuously formed throughout the whole range without being separated at the respective filter regions 11, 12.

SUMI HIROFUMI (JP)
KODAKE TOSHIAKI (JP)
SOBUE MOTOSHI (JP)

PCT/JP2021/004600

August 19, 2021

February 08, 2021

Click for automatic bibliography generation  

NANOLUX CO LTD (JP)

G02B1/11; G02B5/20; G02B5/28; G06T1/00; H01L27/146

WO2005069376A1	2005-07-28
WO2018155486A1	2018-08-30

OMORI Keiko (JP)

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