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Title:
OPTICAL MEASUREMENT SYSTEM AND OPTICAL MEASUREMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2023/042339
Kind Code:
A1
Abstract:
This optical measurement system includes a first light source that generates infrared rays, an image sensor having a silicon base, and an optical system including a beam splitter that splits light from the first light source into a first light and a second light. The optical system is configured to record, using the image sensor, a first hologram obtained by illuminating a sample with the first light and modulating the resulting light with the second light, which is divergent light.

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Inventors:
SHIMODA KENSAKU (JP)
MIZUGUCHI TSUTOMU (JP)
SANO HIROYUKI (JP)
Application Number:
PCT/JP2021/034111
Publication Date:
March 23, 2023
Filing Date:
September 16, 2021
Export Citation:
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Assignee:
OTSUKA DENSHI KK (JP)
International Classes:
G03H1/08; G01B11/24; G01N21/45; G01N21/88
Domestic Patent References:
WO2014054776A12014-04-10
WO2019044336A12019-03-07
WO2015064088A12015-05-07
WO2012005315A12012-01-12
WO2020045584A12020-03-05
Foreign References:
JP2013178484A2013-09-09
JP2007524075A2007-08-23
US20080137933A12008-06-12
JP2012530929A2012-12-06
JP2011033449A2011-02-17
Other References:
TORAY, WAFER INTERNAL DEFECT INSPECTION SYSTEM ''INSPECTRA® IR, 6 September 2021 (2021-09-06), Retrieved from the Internet
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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