Title:
OPTICAL PROXIMITY CORRECTION FOR PHASE SHIFTING PHOTOLITHOGRAPHIC MASKS
Document Type and Number:
WIPO Patent Application WO2002101464
Kind Code:
A3
Abstract:
A method for producing a computer readable definition of photolithographic mask used to define a target pattern is provided. The phase shift mask patterns include phase shift windows, and the trim mask patterns include trim shapes, which have boundaries defined by such sets of line segments. For a particular pair of phase shift windows used to define a target feature in a target pattern, each of the phase shift windows in the pair can be considered to have a boundary that includes at least one line segment that abuts the target feature. Likewise, a complementary trim shape used in definition of the target feature, for example by including a transmissive region used to clear an unwanted phase transition between the particular pair of phase shift windows, includes at least one line segment that can be considered to abut the target feature. Proximity correction is provided by adjusting the position of the at least one line segment on the boundary of a phase shift windows in said pair which abuts the target feature, and by adjusting the position of the at least one line segment on the boundary of the complementary trim shape which abuts the target feature.
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Inventors:
PIERRAT CHRISTOPHE (US)
COTE MICHEL LUC (US)
COTE MICHEL LUC (US)
Application Number:
PCT/US2002/017667
Publication Date:
December 11, 2003
Filing Date:
June 07, 2002
Export Citation:
Assignee:
NUMERICAL TECH INC (US)
PIERRAT CHRISTOPHE (US)
COTE MICHEL LUC (US)
PIERRAT CHRISTOPHE (US)
COTE MICHEL LUC (US)
International Classes:
G03C5/00; G03F1/30; G03F7/20; G03F9/00; G06F17/50; H01L21/027; G03F1/36; G03F; (IPC1-7): G03F1/00; G03F1/14
Foreign References:
| US6014456A | 2000-01-11 | |||
| EP1184722A2 | 2002-03-06 |
Other References:
KIKUCHI K ET AL: "METHOD OF EXPANDING PROCESS WINDOW FOR THE DOUBLE EXPOSURE TECHNIQUE WITH ALT-PSMS", PROCEEDINGS OF THE SPIE, vol. 4000, 1 March 2000 (2000-03-01), Bellingham,VA,US, pages 121 - 131, XP008020426, ISSN: 0015-5500
SPENCE C ET AL: "INTEGRATION OF OPTICAL PROXIMITY CORRECTION STRATEGIES IN STRONG PHASE SHIFTERS DESIGN FOR POLY-GATE LAYERS", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3873, 15 September 1999 (1999-09-15), pages 277 - 287, XP008019346
SPENCE C ET AL: "INTEGRATION OF OPTICAL PROXIMITY CORRECTION STRATEGIES IN STRONG PHASE SHIFTERS DESIGN FOR POLY-GATE LAYERS", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 3873, 15 September 1999 (1999-09-15), pages 277 - 287, XP008019346
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