Title:
OPTICAL PROXIMITY EFFECT CORRECTION METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/203966
Kind Code:
A1
Abstract:
An optical proximity effect correction method and apparatus. The optical proximity effect correction method comprises: acquiring an original target pattern, and pre-processing the original target pattern to form a secondary target pattern, so that the secondary target pattern satisfies a preset process rule; performing optical proximity effect correction processing on the secondary target pattern, so as to acquire a corrected pattern; acquiring a simulated profile of the original target pattern according to the corrected pattern; calculating the deviation between the simulated profile and the original target pattern; and determining whether the corrected pattern satisfies process requirements according to the deviation value. In this way, the problem of serious distortion of a lithographic pattern after optical proximity effect correction in the prior art is solved.
Inventors:
CHEN CHIH-LI (CN)
Application Number:
PCT/CN2021/082461
Publication Date:
October 14, 2021
Filing Date:
March 23, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G03F1/36
Foreign References:
| CN103186030A | 2013-07-03 | |||
| CN109143773A | 2019-01-04 | |||
| CN110456615A | 2019-11-15 | |||
| CN108073047A | 2018-05-25 | |||
| US20060085773A1 | 2006-04-20 | |||
| CN103149792A | 2013-06-12 | |||
| CN101738850A | 2010-06-16 | |||
| US20100129740A1 | 2010-05-27 |
Attorney, Agent or Firm:
BEIJING INTELLEGAL INTELLECTUAL PROPERTY AGENT LTD. (CN)
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