Title:
OPTICAL SYSTEM FOR LINE GENERATOR AND LINE GENERATOR
Document Type and Number:
WIPO Patent Application WO/2021/024808
Kind Code:
A1
Abstract:
Provided is an optical system for a line generator, the optical system configured so that adjustment is easy, the uniformity of the light intensity of a line is high, and the light intensity of the line can be easily changed. The optical system for a line generator generates a line by means of a light flux, and comprises: an optical element having a curvature in only a first direction; and first and second lens array surfaces. The first and second lens array surfaces each include a plurality of lens surfaces arranged in a second direction that is orthogonal to the first direction. The plurality of lens surfaces have a curvature mainly in the second direction. A discretionary lens surface of one of the first and second lens array surfaces corresponds to one lens surface of the other of the first and second lens array surfaces, and the direction of a first straight line connecting the apexes of two corresponding lens surfaces is orthogonal to the second direction. In a cross-section including the first straight line and a second straight line in the second direction that is orthogonal to the first straight line, one of the two lens surfaces is configured as an image formation surface for an infinite object point of the other lens surface.
Inventors:
ISHII KENTA (JP)
SEKI DAISUKE (JP)
SEKI DAISUKE (JP)
Application Number:
PCT/JP2020/028455
Publication Date:
February 11, 2021
Filing Date:
July 22, 2020
Export Citation:
Assignee:
NALUX CO LTD (JP)
International Classes:
F21S2/00
Domestic Patent References:
| WO2012120566A1 | 2012-09-13 |
Foreign References:
| JP2010278437A | 2010-12-09 | |||
| JP2014010428A | 2014-01-20 |
Attorney, Agent or Firm:
FUSHIMI, Naoya (JP)
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