Title:
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
Document Type and Number:
WIPO Patent Application WO/2015/026482
Kind Code:
A3
Abstract:
Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
Inventors:
MEYERS STEPHEN T (US)
KESZLER DOUGLAS A (US)
JIANG KAI (US)
ANDERSON JEREMY (US)
GRENVILLE ANDREW (US)
KESZLER DOUGLAS A (US)
JIANG KAI (US)
ANDERSON JEREMY (US)
GRENVILLE ANDREW (US)
Application Number:
PCT/US2014/048212
Publication Date:
May 14, 2015
Filing Date:
July 25, 2014
Export Citation:
Assignee:
INPRIA CORP (US)
International Classes:
G03C1/00
Foreign References:
| US20120223418A1 | 2012-09-06 | |||
| US20110135823A1 | 2011-06-09 | |||
| US20110244403A1 | 2011-10-06 | |||
| US20030124457A1 | 2003-07-03 |
Attorney, Agent or Firm:
FOSSEN, Kayla, J. et al. (PLLCMoore Lake Plaza, Suite 205,1250 East Moore Lake Driv, Fridley MN, US)
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