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Title:
ORIGINAL PLATE FOR ON-MACHINE DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE MANUFACTURING METHOD, AND LITHOGRAPHIC PRINTING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/241688
Kind Code:
A1
Abstract:
Provided are an original plate for an on-machine development type lithographic printing plate, that comprises a support, an image recording layer, and an outermost layer in this order, the image recording layer including a polymerization initiator, a polymerizable compound, and an infrared absorber, and a decomposition rate of the infrared absorber after storing for 8 hours in an environment with an ozone concentration of 150 ppb being 50% or less, a lithographic printing plate manufacturing method using the original plate for a lithographic printing plate, and a lithographic printing method.

Inventors:
AIZU KOHEI (JP)
ENOMOTO KAZUAKI (JP)
KOYAMA ICHIRO (JP)
SAKAGUCHI AKIRA (JP)
YAMAMOTO AKIRA (JP)
Application Number:
PCT/JP2021/020203
Publication Date:
December 02, 2021
Filing Date:
May 27, 2021
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
B41C1/10; B41M1/06; B41N1/14; G03F7/00; G03F7/004; G03F7/027; G03F7/029; G03F7/031; G03F7/09; G03F7/11
Domestic Patent References:
WO2019013268A12019-01-17
WO2019219560A12019-11-21
WO2019013268A12019-01-17
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"Iwanami Dictionary of Physics and Chemistry", 1998, IWANAMI SHOTEN
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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