Title:
PARTICLE BEAM IRRADIATION SYSTEM AND PARTICLE BEAM IRRADIATION FACILITY
Document Type and Number:
WIPO Patent Application WO/2021/049131
Kind Code:
A1
Abstract:
The purpose of the present invention is to reduce the installation area of a particle beam treatment system. A particle beam irradiation system according to one embodiment of the present invention comprises an accelerator which is installed on a floor and which accelerates a charged particle beam, a transport device which transports the charged particle beam emitted from the accelerator, an irradiation device which irradiates a subject to be irradiated with the charged particle beam transported by the transport device, and a gantry which is installed on the floor and has the irradiation device attached thereto. The gantry also includes a rotator which rotates the irradiation device around the subject to be irradiated, and a support device which supports the rotator from the floor at a position in which the projection plane of the rotator on the floor and the projection plane of the accelerator or the transport device on the floor overlap at least partially.
Inventors:
TAKIZAWA KENICHI (JP)
NISHIUCHI HIDEAKI (JP)
KATAYOSE TADASHI (JP)
NISHIUCHI HIDEAKI (JP)
KATAYOSE TADASHI (JP)
Application Number:
PCT/JP2020/025029
Publication Date:
March 18, 2021
Filing Date:
June 25, 2020
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
A61N5/10
Domestic Patent References:
| WO2017212290A1 | 2017-12-14 | |||
| WO2013108534A1 | 2013-07-25 | |||
| WO2015042525A1 | 2015-03-26 |
Foreign References:
| JP2011182987A | 2011-09-22 |
Attorney, Agent or Firm:
WILLFORT INTERNATIONAL PATENT FIRM (JP)
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