Title:
PATTERN-FORMING DEVICE AND PATTERN-FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/206044
Kind Code:
A1
Abstract:
A pattern-forming device for forming a pattern in a predetermined region on a substrate moving in a first direction, the device comprising: a first alignment system that optically detects first substrate marks formed on the substrate and spaced at predetermined intervals in the first direction, in a first detection region set upstream of the predetermined region in the first direction; a second alignment system that optically detects, in a second detection region set upstream of the predetermined region in the first direction, second substrate marks which are formed on the substrate, are spaced at predetermined intervals in the first direction, and are separated from the first substrate marks by a predetermined distance in a second direction orthogonal to the first direction; a reference-indicating member extending in the second direction along the first and second alignment systems, and having reference-indicating marks formed at portions which correspond to the first and second detection regions, respectively, in the second direction; and optical combination members that are provided in the first and second alignment systems, respectively, and that perform combination of light beams so as to cause light beams from the reference-indicating marks to pass through an optical path through which light beams from the substrate marks pass.
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Inventors:
KATO MASAKI (JP)
Application Number:
PCT/JP2021/014467
Publication Date:
October 14, 2021
Filing Date:
April 05, 2021
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F9/00; G03F7/20; G03F7/24
Domestic Patent References:
| WO2015152218A1 | 2015-10-08 |
Foreign References:
| JP2006098726A | 2006-04-13 | |||
| JP2004069585A | 2004-03-04 | |||
| US20160313653A1 | 2016-10-27 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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