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Patent Searching and Data


Title:
PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY USING BORON NITRIDE NANOTUBE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2021/080294
Kind Code:
A1
Abstract:
A pellicle for extreme ultraviolet lithography has a center layer formed of one of BNNT, BNNT/SiMx, SiMx/BNNT, SiMx/BNNT/SiMx by utilizing a boron nitride nanotube (BNNT) and a silicon compound (SiMx). By forming the center layer utilizing a boron nitride nanotube having excellent stability in an extreme ultraviolet lithography environment, excellent mechanical strength, and high optical transmittance, the performance of the pellicle can be improved.

Inventors:
NAM KEE-SOO (KR)
LEE CHANG-HUN (KR)
YUN JONG-WON (KR)
Application Number:
PCT/KR2020/014350
Publication Date:
April 29, 2021
Filing Date:
October 20, 2020
Export Citation:
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Assignee:
S&S TECH CO LTD (KR)
International Classes:
G03F1/62; G03F7/20; H01L21/02; H01L21/027; H01L21/28; H01L21/324; H01L21/768
Foreign References:
KR20180029384A2018-03-21
KR20190053766A2019-05-20
US20190129300A12019-05-02
US20150309405A12015-10-29
KR20170089449A2017-08-04
Attorney, Agent or Firm:
HUH, Sung-won et al. (KR)
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